Compartir
High-K Materials in Multi-Gate fet Devices (Science, Technology, and Management) (en Inglés)
Shubham Tayal, Parveen Singla, J. Paulo Davim (Autor)
·
Crc Press
· Tapa Dura
High-K Materials in Multi-Gate fet Devices (Science, Technology, and Management) (en Inglés) - Shubham Tayal, Parveen Singla, J. Paulo Davim
S/ 452,87
S/ 905,74
Ahorras: S/ 452,87
Elige la lista en la que quieres agregar tu producto o crea una nueva lista
✓ Producto agregado correctamente a la lista de deseos.
Ir a Mis Listas
Origen: Estados Unidos
(Costos de importación incluídos en el precio)
Se enviará desde nuestra bodega entre el
Jueves 08 de Agosto y el
Martes 20 de Agosto.
Lo recibirás en cualquier lugar de Perú entre 2 y 5 días hábiles luego del envío.
Reseña del libro "High-K Materials in Multi-Gate fet Devices (Science, Technology, and Management) (en Inglés)"
High-k Materials in Multi-Gate FET Devices focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. It covers the various way of utilizing high-k dielectrics in multi-gate FETs for enhancing their performance at the device as well as circuit level. Provides basic knowledge about FET devices Presents the motivation behind multi-gate FETs, including current and future trends in transistor technologies Discusses fabrication and characterization of high-k materials Contains a comprehensive analysis of the impact of high-k dielectrics utilized in the gate-oxide and the gate-sidewall spacers on the GIDL of emerging multi-gate FET architectures Offers detailed application of high-k materials for advanced FET devices Considers future research directions This book is of value to researchers in materials science, electronics engineering, semiconductor device modeling, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues.
